宽禁带材料部-碳化硅晶体(SiC)

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研究与开发
贰陆公司投入充足的资金来研究和开发碳化硅晶体及其他宽禁带材料,把开发独一无二的生长技术和生产工艺作为重点。
贰陆公司宽禁带材料部发表的研究成果包括:
  • T. Anderson et al, "Advanced PVT Growth of 2 & 3 Inch Diameter 6H SiC Crystals", Mat. Sci. Forum, Vol. 457-460 (2004), pp. 75-78
  • M. Yoganathan et al, "Growth of Large Diameter Semi-Insulating 6H-SiC Crystals by Physical Vapor Transport", Mat. Res. Soc. Symp. Proc. Vol. 815 (2004) J5.9.1
  • A. Gupta et al, "6H and 4H-SiC Bulk Growth by PVT and Advanced PVT (APVT)", Mat. Res. Soc. Symp. Proc. Vol. 815 (2004) J5.24
  • I. Zwieback et al, "Growth of Large Diameter SiC Crystals by Advanced Physical Vapor Transport", ECSCRM 2004 Conference Proceedings (Bologna, Italy), To Be Published
  • T. Anderson et al, "Growth of Undoped (Vanadium-Free) Semi-Insulating 6H-SiC Single Crystals", ECSCRM 2004 Conference Proceedings (Bologna, Italy), To Be Published
  • C. Martin et al, "Sub-Surface Damage Removal in Fabrication & Polishing of Silicon Carbide", Compound Semiconductor MANTECH Conference Proceedings, May, 2004, pp. 291-294
  • E. Emorhokpor, et al, "Characterization and Mapping of Crystal Defects in Silicon Carbide", Compound Semiconductor MANTECH Conference Proceedings, May, 2004, pp. 139-142

 

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